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氧化铜(粉状)Cupric oxide powder
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GB/T 647-78
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项目Item 分析纯 化学纯
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(AR) (CP)
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含量(CuO)Assay,% ≥99.0 98.0
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盐酸不溶物lnsoluble in hydrochloric acid,% ≤0.002 0.05
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氯化物(Cl)Chloride,% ≤0.003 0.005
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硫化合物(以SO4计)Sulfur compound,% ≤0.01 0.05
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氮化合物(N)Nitrogen compound,% ≤0.002 0.005
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碳化合物(以CO3计)Nitrogen compound,% ≤0.025 0.1
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铁(Fe)Iron,% ≤0.01 0.04
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氧化亚铜(Cu2O)Cuprous oxide,% ≤0.05 0.1
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硫化氢不沉淀物(以硫酸盐计)Substances not
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precipitated by hydrogen sulfide,% ≤0.2 0.5
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ACS级
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项目名称Item ACS Grade
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含量(CuO)Assay(CuO) ≥99.0%
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稀盐酸不溶物Insoluble in dilute hydrochloric acid ≤0.02%
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碳化合物(以C计)Carbon compounds(as C) ≤0.01%
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氯化物(Cl)Chloride(Cl) ≤0.005%
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氮化合物(以N计)Nitrogen compounds(as N) ≤0.002%
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硫酸盐(SO4)Sulfate ≤0.02%
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钙(Ca)Calcium(Ca) ≤0.01%
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铁(Fe)Iron(Fe) ≤0.05%
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钾(K)Potassium(K) ≤0.02%
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钠(Na)Sodium(Na) ≤0.05%
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99.9% metals basis:
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外观Appearance Black Powder
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X-射线衍射分析X-Ray Diffraction Conforms to Structure
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纯度Purity ≥99.9%
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铜Cu (Complexometric EDTA) 78.7 - 81.1 %
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ICP: Confirms Copper Component Confirmed
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痕量金属分析total metallic impurities ≤1000ppm by ICP Atomic emission
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(Na、Ni、Ca、Ag、Ba、Zn、Al、V、Ga、Tl、Cr、Mo、Sn、Pb、Mn、As、Fe、Se、Co、Rh)
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99.99% metals basis:
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外观Appearance Black Powder
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X-射线衍射分析X-Ray Diffraction Conforms to Structure
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纯度Purity ≥99.99%
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铜Cu (Complexometric EDTA) 78.7 - 81.1 %
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ICP: Confirms Copper Component Confirmed
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痕量金属分析total metallic impurities ≤200ppm by ICP Atomic emission
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(Na、Ni、Ca、Ag、Ba、Zn、Al、V、Ga、Tl、Cr、Mo、Sn、Pb、Mn、As、Fe、Se、Co、Rh)
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40nm 球形，99.5%
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外观Appearance Black powder
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络合滴定Complexometric EDTA (% Cu) 77.0 - 82.6 %
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X射线衍射X-Ray Diffraction Conforms to Structure
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平均粒径Average Particle Size ≤40 nm
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比表面积Specific Surface Area 25 - 40 m2/g（Typically）
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